課程資訊
課程名稱
半導體製程中的輸送現象
Transport phenomena in semiconductor manufacturing 
開課學期
112-1 
授課對象
重點科技研究學院  奈米工程與科學博士學位學程  
授課教師
李 雨 
課號
AM7191 
課程識別碼
543EM5440 
班次
 
學分
3.0 
全/半年
半年 
必/選修
選修 
上課時間
星期二5,6,7(12:20~15:10) 
上課地點
應113 
備註
本課程以英語授課。
總人數上限:98人 
 
課程簡介影片
 
核心能力關聯
核心能力與課程規劃關聯圖
課程大綱
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課程概述

A sequence of processes, including oxidation, photolithography, etching, doping, deposition and planarization on a wafer, performed in a clean-room environment, are involved in semiconductor manufacturing. All these processes, as well as the formation of the single-crystal ingot (wafers are sliced from it) and the clean-room design, are related to the transport phenomena of momentum (fluid mechanics), heat, and mass (including particulate matter). Understanding those transport phenomena is crucial for better design of the processes and products. The theme of this course is to study the transport phenomena in details of these processes, from the viewpoint of fluid mechanics. As the critical dimension of the semiconductor product decrease, mechanics in nano-scales related to the processes will also be addressed. Also discussed in the course is the environmental impact arising from the chemical wastes in semiconductor manufacturing. 

課程目標
The goal of this course is to provide students knowledges of the transport phenomena for the processes in semiconductor manufacturing, which is helpful for a better design of application. 
課程要求
The students who take this course for credit should have certain knowledges in differential equations, fluid mechanics, and heat transfer. 
預期每週課後學習時數
6 hours 
Office Hours
每週三 13:00~15:00
每週一 13:00~14:00 備註: Other times by appointment. 
指定閱讀
Lecture notes and the related materials, which will be posted on the NTUCOOL website according to the schedule. 
參考書目
(1) Gary S. May and Simon M. Sze, “Fundamentals of semiconductor fabrication,” Wiley, 2004.
(2) Gary S. May and Costas J. Spanos, "Fundamentals of semiconductor manufacturing and process control,” John Wiley and Sons, Inc., 2006.
(3) S. M. Sze and M. K. Lee, “Semiconductor Devices: Physics and Technology,” 3rd ed., John Wiley & Sons, Inc., 2012.
(4) MKS Instruments Handbook 2nd. Edition. Available from the website "https://www.mks.com/mks-handbook".
(5) Frank M. White, “Viscous fluid flow,” 3rd ed., McGraw-Hill, 2006.
(6) R. Byron Bird, Warren E. Stewart, and Edwin N, Lightfoot, “Transport phenomena,” 2nd ed., John-Wiley & Sons, Inc., 2002.
(7) Sheldon K, Friedlander, “Smokes, dusts, and haze – Fundamentals of aerosol dynamics,” 2nd ed., Oxford University Press, 2000.
(8) Jacob N. Israelachvilli, “Intermolecular and surface forces,” 3rd ed., Academic press, 2011. 
評量方式
(僅供參考)
 
No.
項目
百分比
說明
1. 
Homework 
50% 
9 sets of homework will be assigned, and the students are expected to submit the homework one week after the assignment. 
2. 
Final report 
50% 
The student is required to write a report on a chosen subject (by the student herself/himself) related to the processes of semiconductor manufacturing. Detailed format will be announced in the class. 
 
針對學生困難提供學生調整方式
 
上課形式
以錄影輔助
作業繳交方式
延長作業繳交期限
考試形式
其他
由師生雙方議定
課程進度
週次
日期
單元主題
第1週
9/5  Introduction to semiconductor manufacturing, and the related transport phenomena. 
第2週
9/12  Transport and collection of particulate matters. 
第3週
9/19  Theory of particle filtration. 
第4週
9/26  Crystal growth. 
第5週
10/2  Photolithography. 
第6週
10/10  National day - No class. 
第7週
10/17  Spin coating. 
第8週
10/24  Film formation, Silicon oxidation. 
第9週
10/31  Film deposition: Physical and chemical deposition. 
第10週
11/7  Wet and dry etching. 
第11週
11/14  Diffusion. 
第12週
11/21  Ion implantation. 
第13週
11/28  Planarization. 
第14週
12/5  Nanoscale mechanics. 
第15週
12/12  Environmental impact. 
第16週
12/19  Due date of the final report.